Agilent Dual Stage DS302 Rotary Vane Pump

$1,000.00

The Agilent DS302 Rotary Vane Pump delivers superb vacuum with its dual-stage design that combines a two-vane roughing pump and four-vane high vacuum pump. It reaches an ultra-low base vacuum of 1.5 x 10-3 mbar at a fast 105 L/min free air displacement rate. Key features include quiet operation at 54 dBa, compact size, lightweight construction, and ability to mount in any orientation. With outstanding performance in a durable package, the DS302 pump integrates seamlessly into vacuum systems for mass spectrometry, leak detection, and other analytical instrumentation.

Description

Title: Agilent Dual Stage DS302 Rotary Vane Pump

Description:

Achieve superior vacuum with the Agilent Dual Stage DS302 Rotary Vane Pump. This high-performance pump delivers the speed and ultimate vacuum needed for critical analytical applications.

The DS302 features a 105 L/min free air displacement rate for fast, efficient evacuation. Its dual-stage design combines a two-vane roughing pump with a four-vane high vacuum pump to reach an ultra-low base vacuum of 1.5 x 10-3 mbar.

An integrated gas ballast valve prevents condensation buildup while a specially formulated PFPE lubricant withstands high temperatures. The pump is also remarkably quiet at 54 dBa.

With its compact and lightweight construction, the DS302 pump is designed for easy integration into vacuum systems. It can be mounted in any orientation and is ideal for use with mass spectrometers, leak detectors, turbo pumps, and other instrumentation.

For outstanding vacuum in a durable, high-performance design, count on the Agilent DS302 Rotary Vane Pump. Order yours today!

Specifications:

Pumping Speed: 105 L/min

Ultimate Vacuum: 1.5 x 10-3 mbar

Inlet Connection: 6 mm hose

Outlet Connection: 14 mm hose

Sound Level: 54 dBa

Dimensions: 21 x 17 x 18 cm

Weight: 16 kg

Power: 220-240V, 50/60Hz

Price: $2,495

Reviews

There are no reviews yet.

Be the first to review “Agilent Dual Stage DS302 Rotary Vane Pump”

Your email address will not be published. Required fields are marked *